Strataglass - CVD Processing

Thin Film Properties

PECVD Film Properties
Insulating
Diffusion Barrier
Wet  Etch BOE
Plasma  Etch
Bulk Stress
Scratch Protection
Hydrogen Inclusion
Thermal Stability
PECVD Silicon Nitride
Good
Very Good
Very Slow
Moderate
Moderately Compressive
Very Good
Moderate
Good
PECVD Oxide
Very Good
Moderate
Fast
Moderate
Mildly Compressive
Good
Moderate
Good
PECVD Oxynitride 50X
Variable
Variable
Variable
Moderate
Variable
Good
Moderate
Good
PECVD Oxynitride 90X
Variable
Variable
Variable
Moderate
Variable
Good
Moderate
Good
LPCVD Film Properties
Insulating
Diffusion Barrier
Wet  Etch BOE
Plasma  Etch
Bulk Stress
Scratch Protection
Hydrogen Inclusion
Thermal Stability
LPCVD Silicon Nitride
Very Good
Very Good
Very Slow
Moderate
Very Tensile
Very Good
Low
Very Good
LPCVD Low Stress Nitride
Very Good
Very Good
Very Slow
Moderate
Variable
Very Good
Low
Very Good
Polysilicon
Moderate Conductor
--
Very Slow
--
Compressive
--
Low
Very Good
Amorphous Silicon
Moderate Conductor
--
Very Slow
--
Compressive
--
Low
Good
Thermal Oxide
Very Good
Moderate
Fast
Moderate
Compressive
Good
Low
Very Good