Strataglass - CVD Processing

Thin Films for Special Purposes

Film Type
Desired Properties
Film Advantages
Application
PECVD Oxynitride 50X
PECVD Oxynitride 90X
Null bulk film stress
Can be deposited to make thick structures and layers without stress to film or substrate.

PECVD Zero Stress Nitride
LPCVD Low Stress Nitride
LPCVD Zero Stress Nitride

Null bulk film stress
Deposited at high temperature

Can be deposited to span open membrane areas or to make free standing objects
Polysilicon
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Amorphous Silicon Wet etch resistant, pinhole free Adapts easily to other processes