Thin Films for Special Purposes
Film
Type |
Desired
Properties |
Film
Advantages |
Application |
| PECVD Oxynitride 50X PECVD Oxynitride 90X |
Null
bulk film stress |
Can
be deposited to make thick structures and layers without stress
to film or substrate. |
|
PECVD Zero Stress Nitride |
Null
bulk film stress |
Can
be deposited to span open membrane areas or to make free standing
objects |
|
| Polysilicon | -- |
-- |
|
| Amorphous Silicon | Wet etch resistant, pinhole free | Adapts easily to other processes |